Effect of Thermal Treatment on Structure and Properties of a-Si:H Films Obtained by Cyclic Deposition.

MLA

Afanas, ev, V. P., et al. “Effect of Thermal Treatment on Structure and Properties of A-Si:H Films Obtained by Cyclic Deposition.” Semiconductors, vol. 36, no. 2, Feb. 2002, p. 230. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=asx&AN=7292046&authtype=sso&custid=ns315887.

APA

Afanas, ev, V. P., Gudovskikh, A. S., Nevedomskiı, V. N., Sazanov, A. P., Sitnikova, A. A., Trapeznikova, I. N., & Terukov, E. I. (2002). Effect of Thermal Treatment on Structure and Properties of a-Si:H Films Obtained by Cyclic Deposition. Semiconductors, 36(2), 230.

Chicago

Afanas, ev, V. P., A. S. Gudovskikh, V. N. Nevedomskiı, A. P. Sazanov, A. A. Sitnikova, I. N. Trapeznikova, and E. I. Terukov. 2002. “Effect of Thermal Treatment on Structure and Properties of A-Si:H Films Obtained by Cyclic Deposition.” Semiconductors 36 (2): 230. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=asx&AN=7292046&authtype=sso&custid=ns315887.