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Double-junction effect in proton-irradiated silicon diodes.
- Source :
-
Journal of Applied Physics . 8/15/2002, Vol. 92 Issue 4, p2013. 4p. 1 Black and White Photograph, 2 Graphs. - Publication Year :
- 2002
-
Abstract
- This article concerns the existence of a double-junction effect in proton-irradiated silicon p[sup +] υ-n[sup +] (pin) diodes demonstrated by surface potential and optical-beam-induced current (OBIC) investigations. By increasing the diode biasing, the junctions existing at both ends in the irradiated devices move towards each other up to join, hence, causing a full depletion of the diodes. Due to the inhomogeneity of the electric field, however, the charge-carrier collection is strongly dependent on the position. The extent of the diode depletion layers at both ends and the shape of the electric field within the p[sup +]-υ-n[sup +] diodes are determined as a function of the bias applied. Three-dimensional photocurrent maps obtained by OBIC profiles allow for imaging the double junction. The deep level analysis evidences the presence of irradiation-induced defects, which are responsible for the double-junction effect. [ABSTRACT FROM AUTHOR]
- Subjects :
- *SILICON diodes
*IRRADIATION
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 92
- Issue :
- 4
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7066761
- Full Text :
- https://doi.org/10.1063/1.1495077