ADHESION BEHAVIOUR OF Si LAYERS.

The aim of this investigation was to determine the adhesion strength and failure of Si layers. The layers were prepared using technology RF PACVD onto steel substrates. Si layers were prepared from HMDSO, its vapors were diluted under various carrying gases. The adhesion of layer systems was evaluated by scratch test, including acoustic emission signals and by static indentation (both Rockwell and Vickers indenter). The results of adhesion are documented by records of morphologies of failures. Results demonstrated that the adhesion behavior of Si layer is improved by introducing carbon. [ABSTRACT FROM AUTHOR]