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Epitaxial growth and thermoelectric properties of TiNiSn and Zr0.5Hf0.5NiSn thin films

Authors :
Jaeger, Tino
Mix, Christian
Schwall, Michael
Kozina, Xeniya
Barth, Joachim
Balke, Benjamin
Finsterbusch, Martin
Idzerda, Yves U.
Felser, Claudia
Jakob, Gerhard
Source :
Thin Solid Films. Nov2011, Vol. 520 Issue 3, p1010-1014. 5p.
Publication Year :
2011

Abstract

Abstract: Due to their exceptional thermoelectric properties Half-Heusler alloys like MNiSn (M=Ti,Zr,Hf) have moved into focus. The growth of single crystalline thin film TiNiSn and Zr0.5Hf0.5NiSn by dc magnetron sputtering is reported. Seebeck and resistivity measurements were performed and their dependence on epitaxial quality is shown. Seebeck coefficient, specific resistivity and power factor for Zr0.5Hf0.5NiSn at room temperature were measured to be 63μVK−1, 14.1μΩm and 0.28mWK−2 m−1, respectively. Multilayers of TiNiSn and Zr0.5Hf0.5NiSn are promising candidates to increase the thermoelectric figure-of-merit by decreasing thermal conductivity perpendicular to the interfaces. The epitaxial growth of multilayers containing TiNiSn and Zr0.5Hf0.5NiSn is demonstrated by measuring satellite peaks in the X-ray diffraction pattern originating from the additional symmetry perpendicular to the film surface. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00406090
Volume :
520
Issue :
3
Database :
Academic Search Index
Journal :
Thin Solid Films
Publication Type :
Academic Journal
Accession number :
67382308
Full Text :
https://doi.org/10.1016/j.tsf.2011.08.008