Mechanism of film growth of pulsed electrodeposition of nanocrystalline copper in presence of thiourea.

MLA

Kumar, K., et al. “Mechanism of Film Growth of Pulsed Electrodeposition of Nanocrystalline Copper in Presence of Thiourea.” Journal of Nanoparticle Research, vol. 13, no. 11, Nov. 2011, pp. 6005–12. EBSCOhost, https://doi.org/10.1007/s11051-011-0419-7.

APA

Kumar, K., Biswas, K., & Balasubramaniam, R. (2011). Mechanism of film growth of pulsed electrodeposition of nanocrystalline copper in presence of thiourea. Journal of Nanoparticle Research, 13(11), 6005–6012. https://doi.org/10.1007/s11051-011-0419-7

Chicago

Kumar, K., Krishanu Biswas, and R. Balasubramaniam. 2011. “Mechanism of Film Growth of Pulsed Electrodeposition of Nanocrystalline Copper in Presence of Thiourea.” Journal of Nanoparticle Research 13 (11): 6005–12. doi:10.1007/s11051-011-0419-7.