Density of states in the gap of amorphous semiconductors determined from modulated photocurrent measurements in the recombination regime.

An experimental technique to study the energy profile of localized states in the gap of amorphous semiconductors is proposed. The method is based on the relationship between the recombination lifetime and the density of states (DOS) at the quasi-Fermi level for trapped carriers. We use the modulated photocurrent experiment in the recombination-limited regime as a convenient method to measure the recombination lifetime. Measurements performed as a function of temperature allow the DOS above the Fermi energy to be determined. The accuracy and limitations of the method are studied by means of computer simulations. The experimental technique is applied to obtain the density of defect states of a hydrogenated amorphous silicon sample. [ABSTRACT FROM AUTHOR]