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Impact of dopants in GaN on the formation of two-dimensional electron gas in AlGaN/GaN heterostructure field-effect transistors.

Authors :
Chu, R.M.
Zheng, Y.D.
Zhou, Y.G.
Han, P.
Shen, B.
Gu, S.L.
Source :
Applied Physics A: Materials Science & Processing. 2002, Vol. 75 Issue 3, p387. 3p.
Publication Year :
2002

Abstract

The two-dimensional electron gas distribution in AlGaN/GaN high electron mobility transistors is determined from the solution of the coupled Schrödinger’s and Poisson’s equations. Considering the piezoelectric effect, the two-dimensional electron gas concentration is calculated to be as high as 7.7×10[sup 19] cm[sup -3] . In order to obtain an understanding of how the two-dimensional electron gas distribution is influenced by dopants in GaN, we observed the two-dimensional electron gas concentration and occupation of sub-bands versus dopant concentration in the GaN layer of an AlGaN/GaN heterostructure. Our results show that the two-dimensional electron gas concentration is slightly increased at higher doping levels in GaN, while the quantum confinement in the AlGaN/GaN heterostructure is weakened with the increase of donor concentration in the GaN layer. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
09478396
Volume :
75
Issue :
3
Database :
Academic Search Index
Journal :
Applied Physics A: Materials Science & Processing
Publication Type :
Academic Journal
Accession number :
6688369
Full Text :
https://doi.org/10.1007/s003390100978