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Failure mechanism of thin Al2O3 coatings grown by atomic layer deposition for corrosion protection of carbon steel

Authors :
Díaz, Belén
Härkönen, Emma
Maurice, Vincent
Światowska, Jolanta
Seyeux, Antoine
Ritala, Mikko
Marcus, Philippe
Source :
Electrochimica Acta. Nov2011, Vol. 56 Issue 26, p9609-9618. 10p.
Publication Year :
2011

Abstract

Abstract: Combined analysis by electrochemical impedance spectroscopy (EIS), time-of-flight secondary ion mass spectrometry (ToF-SIMS) and field emission scanning electron microscopy (FESEM) of the corrosion protection provided to carbon steel by thin (50nm) Al2O3 coatings grown by atomic layer deposition (ALD) and its failure mechanism is reported. In spite of excellent sealing properties, the results show an average dissolution rate of the alumina coating of ∼7nmh−1 in neutral 0.2M NaCl and increasing porosity of the remaining layers with increasing immersion time. Alumina dissolution is triggered by the penetration of the solution via cracks/pinholes through the coating to the substrate surface where oxygen reduction takes place, raising the pH. At defective substrate surface sites of high aspect ratio and concentrated residual mechanical stress (along scratches) presumably exposing a higher steel surface fraction, localized dissolution of the coating is promoted by a more facile access of the solution to the substrate surface enhancing oxygen reduction. De-adhesion of the coating is also promoted in these sites by the ingress of the anodic dissolution trenching the steel surface. Localized corrosion of the alloy (i.e. pitting) is triggered prior to complete dissolution of the alumina film on the elsewhere still coated surface matrix. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00134686
Volume :
56
Issue :
26
Database :
Academic Search Index
Journal :
Electrochimica Acta
Publication Type :
Academic Journal
Accession number :
66854297
Full Text :
https://doi.org/10.1016/j.electacta.2011.07.104