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Real-time x-ray scattering study on the thermal evolution of interface roughness in CoSi[sub2] formation.

Authors :
Tae Soo Kang
Jung Ho Le
Source :
Applied Physics Letters. 2/25/2002, Vol. 80 Issue 8, p1361. 3p. 3 Graphs.
Publication Year :
2002

Abstract

Examines the thermal evolution of interface roughness during cobalt silicide formation in the Co/Ti/Si(001) and Co/Si(001) systems. Use of real-time synchroton x-ray scattering measurement; Enhancement of the CoSi[sub 2]/Si(001) interface roughness; Suppression of the reaction between the cobalt overlayer and silicon substrate.

Subjects

Subjects :
*SURFACE roughness
*COBALT
*SILICON

Details

Language :
English
ISSN :
00036951
Volume :
80
Issue :
8
Database :
Academic Search Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
6410960
Full Text :
https://doi.org/10.1063/1.1455149