Interfacial, optical properties and band offsets of HfTiON thin films with different nitrogen concentrations.

MLA

Liu, M., et al. “Interfacial, Optical Properties and Band Offsets of HfTiON Thin Films with Different Nitrogen Concentrations.” Journal of Applied Physics, vol. 110, no. 2, July 2011, p. 024110. EBSCOhost, https://doi.org/10.1063/1.3609083.

APA

Liu, M., Fang, M., Wang, X. J., Luo, Y. Y., Wang, H. M., Kang, S. H., Zhang, L. D., & Fang, Q. (2011). Interfacial, optical properties and band offsets of HfTiON thin films with different nitrogen concentrations. Journal of Applied Physics, 110(2), 024110. https://doi.org/10.1063/1.3609083

Chicago

Liu, M., M. Fang, X. J. Wang, Y. Y. Luo, H. M. Wang, S. H. Kang, L. D. Zhang, and Q. Fang. 2011. “Interfacial, Optical Properties and Band Offsets of HfTiON Thin Films with Different Nitrogen Concentrations.” Journal of Applied Physics 110 (2): 024110. doi:10.1063/1.3609083.