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Fabrication of metallic nanocones by induced deposition of etch masks and ion milling
- Source :
-
Microelectronic Engineering . Aug2011, Vol. 88 Issue 8, p2247-2250. 4p. - Publication Year :
- 2011
-
Abstract
- Abstract: A versatile process for the fabrication of metallic nanocones is presented that is applicable to different surface topographies. The process is based on thin-film metallization, focused electron beam induced deposition of local etch masks, and argon ion milling. Nanocones can be crafted from different metals. Examples are shown for the optimization of the process for gold nanocones of different sizes. With this process, individual cones can be positioned on both planar and non-planar surfaces. It therefore enables integration of sharp-tipped nanocones into extreme topographies. [Copyright &y& Elsevier]
Details
- Language :
- English
- ISSN :
- 01679317
- Volume :
- 88
- Issue :
- 8
- Database :
- Academic Search Index
- Journal :
- Microelectronic Engineering
- Publication Type :
- Academic Journal
- Accession number :
- 62554380
- Full Text :
- https://doi.org/10.1016/j.mee.2011.02.090