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Thin Al2O3 barrier coatings onto temperature-sensitive packaging materials by atomic layer deposition
- Source :
-
Surface & Coatings Technology . Aug2011, Vol. 205 Issue 21/22, p5088-5092. 5p. - Publication Year :
- 2011
-
Abstract
- Abstract: Thin (25nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 80 and 100°C onto various bio-based polymeric materials employing the atomic layer deposition (ALD) technique. The work demonstrates that the ALD-grown Al2O3 coating significantly enhances the oxygen and water vapor barrier performance of these materials. Promising barrier properties were revealed for polylactide-coated board, hemicellulose-coated board as well as various biopolymer (polylactide, pectin and nano-fibrillated cellulose) films. [Copyright &y& Elsevier]
Details
- Language :
- English
- ISSN :
- 02578972
- Volume :
- 205
- Issue :
- 21/22
- Database :
- Academic Search Index
- Journal :
- Surface & Coatings Technology
- Publication Type :
- Academic Journal
- Accession number :
- 61919009
- Full Text :
- https://doi.org/10.1016/j.surfcoat.2011.05.017