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Tailoring the wettability of patterned silicon surfaces with dual-scale pillars: From hydrophilicity to superhydrophobicity
- Source :
-
Applied Surface Science . Jun2011, Vol. 257 Issue 17, p7689-7692. 4p. - Publication Year :
- 2011
-
Abstract
- Abstract: Wettability tailoring of patterned silicon surface has great potential in fields producing integrated circuits, solar cells, sensors, detectors, and micro/nano electromechanical systems. The present paper presents a convenient yet effective method of combining reactive ion etching and catalyzed etching to prepare silicon surface with micro–nano dual-scale pillars. The experimental results indicate that the hydrophilic surface transformed to a superhydrophobic surface when micro–nano dual-scale pillars were formed. The surface preserved superhydrophobicity even when the geometric parameters of the micropillars were changed. Overhangs of water drops on steep micro–nano dual-scale pillars result in superhydrophobicity. This method offers a new way for tailoring the wettability of patterned silicon surfaces. [Copyright &y& Elsevier]
Details
- Language :
- English
- ISSN :
- 01694332
- Volume :
- 257
- Issue :
- 17
- Database :
- Academic Search Index
- Journal :
- Applied Surface Science
- Publication Type :
- Academic Journal
- Accession number :
- 60785955
- Full Text :
- https://doi.org/10.1016/j.apsusc.2011.04.009