Nanometric patterning of zinc by optical near-field photochemical vapour deposition.

A new technique, optical near-field photochemical vapour deposition (NFO-PCVD) enables maskless production of nanometric structures with controllable size, chemical composition and morphology. By placing a near-field optical microscope inside the reaction chamber for photochemical vapour deposition we have deposited nanoscale metal patterns. We demonstrate for the first time, successfully deposited in the near-field region, lines of metallic zinc with the observed stripe width of 20 nm. [ABSTRACT FROM AUTHOR]