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Growth of (110)-oriented CeO[sub 2] layers on (100) silicon substrates.

Authors :
Inoue, T.
Ohsuna, T.
Luo, L.
Wu, X.D.
Maggiore, C.J.
Yamamoto, Y.
Sakurai, Y.
Chang, J.H.
Source :
Applied Physics Letters. 12/30/1991, Vol. 59 Issue 27, p3604. 3p. 2 Diagrams, 2 Graphs.
Publication Year :
1991

Abstract

Examines the growth of (110)-oriented cerium dioxide (CeO[sub 2] layers on (100) silicon substrates. Importance of the electron-beam evaporation in CeO[sub 2] growth; Characteristics of CeO[sub 2] epitaxial layers; Interface between the amorphous layer and the silicon substrate.

Details

Language :
English
ISSN :
00036951
Volume :
59
Issue :
27
Database :
Academic Search Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
5778326
Full Text :
https://doi.org/10.1063/1.105646