Japan's Contributions to Ion Beam Technologies.

In the series of Ion Implantation Technology conferences, several excellent reviews of the history of ion beam technology development have been presented. All of these articles have included descriptions of the evolution of ion implantation equipment and processing. Since 1970, a wide range of other ion beam processing techniques has been developed, not only ion implantation into semiconductor materials for IC fabrication, but also many other techniques for electronic, magnetic and optical devices. In this paper, several of Japan's important contributions to ion beam technologies and development efforts involving international collaborations in these fields will be discussed. [ABSTRACT FROM AUTHOR]