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Grain orientation measurement of passivated aluminum interconnects by x-ray micro diffraction.

Authors :
Chang, Chang-Hwan
Valek, B. C.
Padmore, H. A.
MacDowell, A. A.
Celestre, R.
Marieb, T.
Bravman, J. C.
Koo, Y. M.
Patel, J. R.
Source :
AIP Conference Proceedings. 2000, Vol. 507 Issue 1, p284. 4p.
Publication Year :
2000

Abstract

The crystallographic orientations of individual grains in a passivated aluminum interconnect line of 0.7-μm width were investigated by using an incident white x-ray microbeam at the Advanced Light Source, Berkeley National Laboratory. Intergrain orientation mapping was obtained with about 0.05° sensitivity by the micro Laue diffraction technique. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
0094243X
Volume :
507
Issue :
1
Database :
Academic Search Index
Journal :
AIP Conference Proceedings
Publication Type :
Conference
Accession number :
5664417