Electroless deposition of Ag nanoparticles on the surface of SiN x :H dielectric layers

Abstract: A simple and effective method for producing Ag nanoparticles at room temperature and on the time scale of several minutes on the surface of hydrogenated Si nitride (SiN x :H) films is presented. Depending on the stoichiometry of SiN x :H layers, Ag nanostructures with different sizes and densities can be produced. The structural properties of the deposited Ag nanoparticles are described in details with respect to the stoichiometries of SiN x :H films. [ABSTRACT FROM AUTHOR]