Full Field Nanoimprint on Mask Aligners Using Substrate Conformal Imprint Lithography Technique.

The article discusses the study which discovered the nanoimprint lithography (NIL) technique called substrate conformal imprint lithography (SCIL) using the equivalent tools on mask aligners from Suss MiroTec AG . It notes that the SCIL process can provide a larger area for imprinting with minimized resolutions. It implies that the SCIL technique can offer the potential reliability and efficiency in high volume production of patterned media storage and high brightness applications using light emitting diodes (LEDs).