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Fabrication of nano-scaled patterns on ceramic thin films and silicon substrates by soft ultraviolet nanoimprint lithography
- Source :
-
Microelectronic Engineering . May2010, Vol. 87 Issue 5-8, p959-962. 4p. - Publication Year :
- 2010
-
Abstract
- Abstract: Soft ultraviolet nanoimprint lithography is a cost-effective and versatile technique for the transfer of nano-scaled patterns to various surfaces. Here, we report on the fabrication of sub-micron square pillar arrays in epitaxial Ba0.7Sr0.3TiO3 ceramic films, using a combination of nanoimprint lithography and inductively coupled plasma etching techniques. Based on a similar approach we have also succeeded in preparing positive (direct) and negative (inverse) replicas of silicon master molds. Such a generic process could find application in various materials. [Copyright &y& Elsevier]
Details
- Language :
- English
- ISSN :
- 01679317
- Volume :
- 87
- Issue :
- 5-8
- Database :
- Academic Search Index
- Journal :
- Microelectronic Engineering
- Publication Type :
- Academic Journal
- Accession number :
- 48400848
- Full Text :
- https://doi.org/10.1016/j.mee.2009.11.141