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Zinc oxide thin film transistors using MgO–Bi1.5Zn1.0Nb1.5O7 composite gate insulator on glass substrate

Authors :
Cho, Nam Gyu
Kim, Dong Hun
Kim, Ho-Gi
Hong, Jae-Min
Kim, Il-Doo
Source :
Thin Solid Films. Mar2010, Vol. 518 Issue 10, p2843-2846. 4p.
Publication Year :
2010

Abstract

Abstract: We report on high mobility ZnO thin film transistors (TFTs) (<5V), utilizing a room temperature grown MgO–Bi1.5Zn1.0Nb1.5O7 (BZN) composite gate insulator on a glass substrate. 30mol% MgO added BZN composite gate insulators exhibited greatly enhanced leakage current characteristics (~<2×10−8 A/cm2 at 0.3MV/cm) due to the high breakdown strength of MgO, while retaining an appropriate high-k dielectric constant of 32. The ZnO-TFTs with MgO–BZN composite gate insulators showed a high field-effect mobility of 37.2cm2/Vs, a reasonable on–off ratio of 1.54×105, a subthreshold swing of 460mV/dec, and a low threshold voltage of 1.7V. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00406090
Volume :
518
Issue :
10
Database :
Academic Search Index
Journal :
Thin Solid Films
Publication Type :
Academic Journal
Accession number :
48118745
Full Text :
https://doi.org/10.1016/j.tsf.2009.09.001