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Atomic layer deposited aluminum oxide barrier coatings for packaging materials
- Source :
-
Thin Solid Films . Mar2010, Vol. 518 Issue 10, p2654-2658. 5p. - Publication Year :
- 2010
-
Abstract
- Abstract: Thin aluminum oxide coatings have been deposited at a low temperature of 80°C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al2O3 coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas. [Copyright &y& Elsevier]
Details
- Language :
- English
- ISSN :
- 00406090
- Volume :
- 518
- Issue :
- 10
- Database :
- Academic Search Index
- Journal :
- Thin Solid Films
- Publication Type :
- Academic Journal
- Accession number :
- 48118698
- Full Text :
- https://doi.org/10.1016/j.tsf.2009.08.025