Layer-by-layer growth of SrFeO3-δ thin films on atomically flat single-terminated SrRuO3/SrTiO3 (111) surfaces

Abstract: We successfully grew SrFeO3−δ thin films in a layer-by-layer manner by pulsed laser deposition (PLD). When the SrFeO3−δ films were directly grown on atomically flat Ti4+-terminated SrTiO3 (111) substrates, the oscillatory reflection-high-energy-electron-diffraction intensity was completely damped after its third oscillation. By contrast, the introduction of SrRuO3 buffer layers onto the SrTiO3 substrates allowed the SFO thin films to grow in a layer-by-layer manner over a far-extended thickness range. The probable mechanism of that growth is electronic reconstruction-reduced electrostatic potential divergence. With that result, the present study provides a means of growing pseudocubic (111)-oriented SrFeO3−δ heterointerfaces, making possible the fabrication of high-functionality oxide heterostructures. [Copyright &y& Elsevier]