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An investigation of amorphous Ge2Se3 structure for phase change memory devices using fluctuation electron microscopy.

Authors :
Jarvis, K.
Carpenter, R. W.
Davis, M.
Campbell, K. A.
Source :
Journal of Applied Physics. Oct2009, Vol. 106 Issue 8, p083507-083512. 5p. 2 Black and White Photographs, 4 Graphs.
Publication Year :
2009

Abstract

Medium range order in amorphous thin films of Ge2Se3, a phase change memory material, was examined using electron nanodiffraction fluctuation electron microscopy. Variance measurements showed that medium range order existed at 0.36 and 0.58 Å-1. The film was not at equilibrium and contained a few monoclinic nanocrystals with weak Bragg maxima at 0.33, 0.54, and 0.63 Å-1, which are related to the GeSe2 equilibrium phase at this composition. We also determined the variance for amorphous silicon (a-Si) and amorphous silica (a-SiO2) and those results agree with others in the literature. It is expected that the medium range order is related to nucleation of the crystallization reaction in Ge2Se3. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00218979
Volume :
106
Issue :
8
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
44909722
Full Text :
https://doi.org/10.1063/1.3225566