Back to Search Start Over

Connecting disorder and magnetic properties in CoFe thin films.

Authors :
Freeland, J. W.
Freeland, J.W.
Bussmann, K.
Bussman, K.
Idzerda, Y. U.
Idzerda, Y.U.
Source :
Applied Physics Letters. 5/1/2000, Vol. 76 Issue 18.
Publication Year :
2000

Abstract

Through a direct study of the chemical and magnetic interfacial disorder in conjunction with magnetic property measurements, evidence is presented that the grain size is the ultimate factor in determining the magnetic coercivity in CoFe thin film structures. © 2000 American Institute of Physics. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
76
Issue :
18
Database :
Academic Search Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
4412787
Full Text :
https://doi.org/10.1063/1.126422