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Ambipolar microcrystalline silicon thin-film transistors

Authors :
Chan, Kah-Yoong
Kirchhoff, Joachim
Gordijn, Aad
Knipp, Dietmar
Stiebig, Helmut
Source :
Thin Solid Films. Oct2009, Vol. 517 Issue 23, p6383-6385. 3p.
Publication Year :
2009

Abstract

Abstract: Hydrogenated microcrystalline silicon (µc-Si:H) has recently received significant attention as a promising material for thin-film transistors (TFTs) in large area electronics due to its high electron and hole charge carrier mobilities. We report on ambipolar TFTs based on microcrystalline silicon prepared by plasma-enhanced chemical vapor deposition at temperature of 160 °C with high electron and hole charge carrier mobilities of 40 cm2/Vs and 10 cm2/Vs, respectively. The ambipolar microcrystalline silicon TFTs provide a simple route in realizing large area integrated circuits at low cost. The electrical characteristics of the ambipolar microcrystalline silicon TFTs will be described and the first results on ambipolar inverters will be presented. The influence of the ambipolar TFT characteristics on the performance of the inverter will be also discussed. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00406090
Volume :
517
Issue :
23
Database :
Academic Search Index
Journal :
Thin Solid Films
Publication Type :
Academic Journal
Accession number :
43766528
Full Text :
https://doi.org/10.1016/j.tsf.2009.02.101