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Two-Laser Lithography Shrinks Transistors on the Cheap.
- Source :
-
IEEE Spectrum . Jun2009, Vol. 46 Issue 6, p16-16. 3/4p. 1 Color Photograph. - Publication Year :
- 2009
-
Abstract
- The article offers information on other uses of optical lithography. It relates that the stimulated emission depletion (STED), a work by Stefan Hell at the Max Planck Institute for Biophysical Chemistry in Göttingen, Germany, has inspired the development of other approaches of optical litography. These approaches include photolithography by Rajesh Menon and colleagues, photoresists, and two-laser lithography by John Fourkas and colleagues.
- Subjects :
- *PHOTOLITHOGRAPHY
*PHOTORESISTS
*LASERS
Subjects
Details
- Language :
- English
- ISSN :
- 00189235
- Volume :
- 46
- Issue :
- 6
- Database :
- Academic Search Index
- Journal :
- IEEE Spectrum
- Publication Type :
- Periodical
- Accession number :
- 43573069
- Full Text :
- https://doi.org/10.1109/MSPEC.2009.4977597