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Study on quasiperiodic Ta/Al multilayer films by x-ray diffraction.
- Source :
-
Applied Physics Letters . 11/11/1991, Vol. 59 Issue 20, p2512. 3p. 1 Chart, 4 Graphs. - Publication Year :
- 1991
-
Abstract
- Examines the fabrication of quasiperiodic tantalum/aluminum multilayer films by magnetron sputtering. Structure characterization of the multilayered films; Use of x-ray diffraction technique; Application of Fibonacci films as optical elements.
- Subjects :
- *MULTILAYERED thin films
*SPUTTERING (Physics)
Subjects
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 59
- Issue :
- 20
- Database :
- Academic Search Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 4322735
- Full Text :
- https://doi.org/10.1063/1.105937