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28nm tapeouts proceeding according to plan.
- Source :
-
Solid State Technology . Jun2009, Vol. 52 Issue 6, p8-9. 2p. - Publication Year :
- 2009
-
Abstract
- The article focuses on the establishment of photomask manufacturing process of Toppan Printing Co. Ltd. at its photomask facility in Asaka, Japan. The main goal of photomask manufacturing process is to support 32nanometer and 28nanometer semiconductor device production through its development project with International Business Machine Corp. Franklin Kalk, Toppan Photomasks chief technical officer (CTO) expects the technology will improve the production efficiency until 16nanometer logic node.
Details
- Language :
- English
- ISSN :
- 0038111X
- Volume :
- 52
- Issue :
- 6
- Database :
- Academic Search Index
- Journal :
- Solid State Technology
- Publication Type :
- Academic Journal
- Accession number :
- 42989194