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Diffusion barrier effects of transition metals for Cu/M/Si multilayers (M=Cr, Ti, Nb, Mo, Ta, W).
- Source :
-
Applied Physics Letters . 3/21/1994, Vol. 64 Issue 12, p1511. 3p. 1 Chart, 4 Graphs. - Publication Year :
- 1994
-
Abstract
- Investigates the diffusion of copper (Cu) into silicon (Si) through various barrier metals to find diffusion barrier materials for copper. Measurement of copper behavior in Cu/M/Si multilayers; Preservation of the multilayer structures of the Cu/Ta/Si and Cu/W/Si multilayers after annealing; Difference in the barrier properties of the transition metals.
- Subjects :
- *DIFFUSION
*COPPER
*TRANSITION metals
Subjects
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 64
- Issue :
- 12
- Database :
- Academic Search Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 4272424
- Full Text :
- https://doi.org/10.1063/1.111875