Novel annealing scheme for fabricating high-quality Ti-silicided shallow n[sup +]p junction by....

MLA

Juang, M. H., and H. C. Cheng. “Novel Annealing Scheme for Fabricating High-Quality Ti-Silicided Shallow n[Sup +]p Junction By...” Applied Physics Letters, vol. 60, no. 13, Mar. 1992, p. 1579. EBSCOhost, https://doi.org/10.1063/1.107257.

APA

Juang, M. H., & Cheng, H. C. (1992). Novel annealing scheme for fabricating high-quality Ti-silicided shallow n[sup +]p junction by... Applied Physics Letters, 60(13), 1579. https://doi.org/10.1063/1.107257

Chicago

Juang, M.H., and H.C. Cheng. 1992. “Novel Annealing Scheme for Fabricating High-Quality Ti-Silicided Shallow n[Sup +]p Junction By...” Applied Physics Letters 60 (13): 1579. doi:10.1063/1.107257.