Simulation and characterization of the selective area growth process.

Authors :: Alam, M.A.
People, R.
Isaacs, E.
Kim, C.Y.
Evans-Lutterodt, K.
Siegrist, T.
Pernell, T.L.
Vandenberg, J.
Sputz, S.K.
Chu, S.N.G.
Lang, D.V.
Smith, L.
Hybertsen, M.S.
Source :: Applied Physics Letters. 5/3/1999, Vol. 74 Issue 18, p2617. 3p. 11 Graphs.
Publication Year :: 1999
Abstract: Interprets the metalorganic chemical vapor deposition technique called selective area growth (SAG) using a three-dimensional vapor phase model. Profiles of thickness predicted by the model; Long range effects of the thickness composition of metals; Uses of the SAG process; Key idea behind SAG.