Back to Search Start Over

Stress measurements using ultraviolet micro-Raman spectroscopy.

Authors :
Dombrowski, K.F.
Dietrich, B.
Source :
Applied Physics Letters. 10/18/1999, Vol. 75 Issue 16, p2450. 2p. 2 Graphs.
Publication Year :
1999

Abstract

Studies the stress measurements using ultraviolet micro-Raman spectroscopy. Raman spectrum of the first-order silicon phonon; Comparison of stress patterns measured; Detection of localized stresses averaged out by longer wavelength light.

Details

Language :
English
ISSN :
00036951
Volume :
75
Issue :
16
Database :
Academic Search Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
4212061
Full Text :
https://doi.org/10.1063/1.125044