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Molecular-beam epitaxial regrwoth on oxygen-implanted GaAs substrates for device integration.

Authors :
Chen, C.L.
Mahoney, L.J.
Source :
Applied Physics Letters. 6/28/1999, Vol. 74 Issue 26, p4058. 3p. 1 Diagram, 4 Graphs.
Publication Year :
1999

Abstract

Describes molecular-beam epitaxial regrowth on oxygen-implanted GaAs substrates for device integration. Device-quality GaAs created by the regrowth; Cutoff frequency of a metal-semiconductor field-effect transistor fabricated on the regrown layer.

Details

Language :
English
ISSN :
00036951
Volume :
74
Issue :
26
Database :
Academic Search Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
4211759
Full Text :
https://doi.org/10.1063/1.123260