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Incorporation of nitrogen in chemical vapor deposition diamond.

Authors :
Samlenski, R.
Haug, C.
Source :
Applied Physics Letters. 11/6/1995, Vol. 67 Issue 19, p2798. 3p. 1 Chart, 2 Graphs.
Publication Year :
1995

Abstract

Examines the incorporation of nitrogen in homoepitaxial chemical vapor deposition diamond films. Application of nuclear reaction analysis; Details on the N/C ratios of the films; Addition of 50 ppm of isotopic nitrogen to the process gas.

Subjects

Subjects :
*NITROGEN
*CHEMICAL vapor deposition

Details

Language :
English
ISSN :
00036951
Volume :
67
Issue :
19
Database :
Academic Search Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
4132328
Full Text :
https://doi.org/10.1063/1.114788
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