Highly selective electroplated nickel mask for lithium niobate dry etching.

MLA

Benchabane, Sarah, et al. “Highly Selective Electroplated Nickel Mask for Lithium Niobate Dry Etching.” Journal of Applied Physics, vol. 105, no. 9, May 2009, pp. 094109-1-094109-6. EBSCOhost, https://doi.org/10.1063/1.3125315.

APA

Benchabane, S., Robert, L., Rauch, J.-Y., Khelif, A., & Laude, V. (2009). Highly selective electroplated nickel mask for lithium niobate dry etching. Journal of Applied Physics, 105(9), 094109-1-094109-6. https://doi.org/10.1063/1.3125315

Chicago

Benchabane, Sarah, Laurent Robert, Jean-Yves Rauch, Abdelkrim Khelif, and Vincent Laude. 2009. “Highly Selective Electroplated Nickel Mask for Lithium Niobate Dry Etching.” Journal of Applied Physics 105 (9): 094109-1-094109-6. doi:10.1063/1.3125315.