Back to Search Start Over

Ultralight lithography.

Authors :
Harned, Noreen
Source :
IEEE Spectrum. Jul99, Vol. 36 Issue 7, p35. 6p. 4 Diagrams, 3 Charts, 1 Graph.
Publication Year :
1999

Abstract

Describes the lithographic tools that may be used to pattern photoresists. Reason for using extreme ultra violet; Details on the illumination system; Range of optical materials and coatings.

Subjects

Subjects :
*LITHOGRAPHY
*PHOTORESISTS

Details

Language :
English
ISSN :
00189235
Volume :
36
Issue :
7
Database :
Academic Search Index
Journal :
IEEE Spectrum
Publication Type :
Periodical
Accession number :
3863146
Full Text :
https://doi.org/10.1109/6.774963