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Ultralight lithography.
- Source :
-
IEEE Spectrum . Jul99, Vol. 36 Issue 7, p35. 6p. 4 Diagrams, 3 Charts, 1 Graph. - Publication Year :
- 1999
-
Abstract
- Describes the lithographic tools that may be used to pattern photoresists. Reason for using extreme ultra violet; Details on the illumination system; Range of optical materials and coatings.
- Subjects :
- *LITHOGRAPHY
*PHOTORESISTS
Subjects
Details
- Language :
- English
- ISSN :
- 00189235
- Volume :
- 36
- Issue :
- 7
- Database :
- Academic Search Index
- Journal :
- IEEE Spectrum
- Publication Type :
- Periodical
- Accession number :
- 3863146
- Full Text :
- https://doi.org/10.1109/6.774963