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Implementation of Modeling and Simulation in Semiconductor Wafer Fabrication with Time....

Authors :
Scholl, Wolfgang
Domaschke, Joerg
Source :
IEEE Transactions on Semiconductor Manufacturing. Aug2000, Vol. 13 Issue 3, p273. 5p. 2 Diagrams, 8 Graphs.
Publication Year :
2000

Abstract

Examines the impact of time constraints on the machine capacity in semiconductor wafer fabrication in the United States. Difficulty of achieving cycle time targets; Analysis of time constraints using discrete event simulation; Installation of time windows between special wet etch and furnace operations to prevent native oxidation on the wafer surface.

Details

Language :
English
ISSN :
08946507
Volume :
13
Issue :
3
Database :
Academic Search Index
Journal :
IEEE Transactions on Semiconductor Manufacturing
Publication Type :
Academic Journal
Accession number :
3542421
Full Text :
https://doi.org/10.1109/66.857935