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Interaction of Pb defects at the (111)Si/SiO2 interface with molecular hydrogen: Simultaneous...

Authors :
Stesmans, A.
Source :
Journal of Applied Physics. 7/1/2000, Vol. 88 Issue 1, p489. 9p. 1 Chart, 4 Graphs.
Publication Year :
2000

Abstract

Analyzes the simultaneous action of passivation and dissociation during thermochemical interaction of trivalent interfacial silicon (Si) traps with molecular hydrogen. Full interaction case; Passivation in hydrogen; Successive passivation treatments in hydrogen; Experimental assessment and verification.

Details

Language :
English
ISSN :
00218979
Volume :
88
Issue :
1
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
3406001
Full Text :
https://doi.org/10.1063/1.373684