Photothermal characterization of thin films and coatings

Abstract: The principles of non-destructive, non-contact characterization of coatings by means of photothermal measuring techniques are briefly explained. A method of quantitative interpretation is presented, which relies on the relative extrema of the calibrated thermal wave phase lags measured as a function of the heating modulation frequency for coatings deposited by reactive magnetron sputtering. The application potential of this interpretation method with respect to the on-line control of coating deposition processes is discussed. [Copyright &y& Elsevier]