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Effects of arsenic mole fraction x on the gain characteristics of type-II InP/GaAs x Sb1− x DHBTs

Authors :
Zeng, Y.P.
Ostinelli, O.
Liu, H.G.
Bolognesi, C.R.
Source :
Solid-State Electronics. Aug2008, Vol. 52 Issue 8, p1202-1206. 5p.
Publication Year :
2008

Abstract

Abstract: The static gain characteristics of N–p–N InP/GaAs x Sb1− x /InP double heterojunction bipolar transistors (DHBTs) were studied as a function of the base arsenic (As) mole fraction x. Compared to the devices with a lattice-matched base (x =0.51), a current gain improvement largely arising from a base current reduction is observed in DHBTs with higher As base mole fractions (and consequently a reduced type-II conduction band discontinuity ΔE C at the emitter-base heterojunction). Both the surface periphery and the intrinsic recombination currents decrease markedly as the base arsenic concentration increases. The present work therefore unambiguously demonstrates that the emitter type-II conduction band discontinuity between the InP emitter and the GaAs x Sb1− x base enhances the undesirable emitter size effects (ESEs) and increases intrinsic recombination currents directly under the emitter contact. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00381101
Volume :
52
Issue :
8
Database :
Academic Search Index
Journal :
Solid-State Electronics
Publication Type :
Academic Journal
Accession number :
33631576
Full Text :
https://doi.org/10.1016/j.sse.2008.05.007