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Photoresist tech on the move.
- Source :
-
Electronic Engineering Times (01921541) . 06/26/2000, Issue 1119, p44. 1/4p. - Publication Year :
- 2000
-
Abstract
- Reports on the emergence of photoresist technology for semiconductor production. Argon fluoride photoresist developed by Hyundai Electronics; Partnership of semiconductor companies and material suppliers in Japan; Competition in developing advanced photolithography techniques.
- Subjects :
- *PHOTORESISTS
*MANUFACTURING processes
Subjects
Details
- Language :
- English
- ISSN :
- 01921541
- Issue :
- 1119
- Database :
- Academic Search Index
- Journal :
- Electronic Engineering Times (01921541)
- Publication Type :
- Periodical
- Accession number :
- 3306953