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Comment on `Dominant diffusing species during cobalt silicide formation' [J. Appl. Phys. 79, 153 (1996)].

Authors :
d'Heurle, F. M.
Zhang, S.-L.
Source :
Journal of Applied Physics. 6/1/2000, Vol. 87 Issue 11, p8216. 2p. 1 Diagram.
Publication Year :
2000

Abstract

Comments on a study concerning the diffusing species in a cobalt silicide formation. History of the order of silicides for silicon device technology; Conclusions.

Subjects

Subjects :
*DIFFUSION
*COBALT
*SILICIDES
*SILICON

Details

Language :
English
ISSN :
00218979
Volume :
87
Issue :
11
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
3289426
Full Text :
https://doi.org/10.1063/1.373526
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