Effects of nitrogen atom doping on optical properties and dielectric constant of HfO2 gate oxides.

MLA

Wang, X. J., et al. “Effects of Nitrogen Atom Doping on Optical Properties and Dielectric Constant of HfO2 Gate Oxides.” Applied Physics Letters, vol. 92, no. 20, May 2008, p. 202906. EBSCOhost, https://doi.org/10.1063/1.2936309.

APA

Wang, X. J., Zhang, L. D., Zhang, J. P., Liu, M., & He, G. (2008). Effects of nitrogen atom doping on optical properties and dielectric constant of HfO2 gate oxides. Applied Physics Letters, 92(20), 202906. https://doi.org/10.1063/1.2936309

Chicago

Wang, X. J., L. D. Zhang, J. P. Zhang, M. Liu, and G. He. 2008. “Effects of Nitrogen Atom Doping on Optical Properties and Dielectric Constant of HfO2 Gate Oxides.” Applied Physics Letters 92 (20): 202906. doi:10.1063/1.2936309.