Back to Search
Start Over
Numerical analysis of the production profile of H0 atoms and subsequent H- ions in large negative ion sources.
- Source :
-
Journal of Applied Physics . Mar2008, Vol. 103 Issue 5, p053302. 12p. 1 Diagram, 2 Charts, 18 Graphs. - Publication Year :
- 2008
-
Abstract
- The production and transport processes of H0 atoms are numerically simulated using a three-dimensional Monte Carlo transport code. The code is applied to the large JAEA 10 ampere negative ion source under the Cs-seeded condition to obtain a spatial distribution of surface-produced H- ions. In this analysis, the amount of H0 atoms produced through dissociation processes of H2 molecules is calculated from the electron temperature and density obtained by Langmuir probe measurements. The high-energy tail of electrons, which greatly affects H0 atom production, is taken into account by fitting a single-probe characteristic as a two-temperature Maxwellian distribution. In the H0 atom transport process, the energy relaxation of the H0 atoms, which affects the surface H- ion production rate, is taken into account. The result indicates that the surface H- ion production is enhanced near the high-electron-temperature region where H0 atom production is localized. [ABSTRACT FROM AUTHOR]
- Subjects :
- *HYDROGEN
*MONTE Carlo method
*ELECTRONS
*ATOMS
*TEMPERATURE
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 103
- Issue :
- 5
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 31335183
- Full Text :
- https://doi.org/10.1063/1.2887996