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Numerical analysis of the production profile of H0 atoms and subsequent H- ions in large negative ion sources.

Authors :
Takado, N.
Tobari, H.
Inoue, T.
Hanatani, J.
Hatayama, A.
Hanada, M.
Kashiwagi, M.
Sakamoto, K.
Source :
Journal of Applied Physics. Mar2008, Vol. 103 Issue 5, p053302. 12p. 1 Diagram, 2 Charts, 18 Graphs.
Publication Year :
2008

Abstract

The production and transport processes of H0 atoms are numerically simulated using a three-dimensional Monte Carlo transport code. The code is applied to the large JAEA 10 ampere negative ion source under the Cs-seeded condition to obtain a spatial distribution of surface-produced H- ions. In this analysis, the amount of H0 atoms produced through dissociation processes of H2 molecules is calculated from the electron temperature and density obtained by Langmuir probe measurements. The high-energy tail of electrons, which greatly affects H0 atom production, is taken into account by fitting a single-probe characteristic as a two-temperature Maxwellian distribution. In the H0 atom transport process, the energy relaxation of the H0 atoms, which affects the surface H- ion production rate, is taken into account. The result indicates that the surface H- ion production is enhanced near the high-electron-temperature region where H0 atom production is localized. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00218979
Volume :
103
Issue :
5
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
31335183
Full Text :
https://doi.org/10.1063/1.2887996