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Epitaxial growth of ultrahigh density Ge1-xSnx quantum dots on Si (111) substrates by codeposition of Ge and Sn on ultrathin SiO2 films.
- Source :
-
Journal of Applied Physics . Dec2007, Vol. 102 Issue 12, p124302. 6p. 2 Diagrams, 3 Graphs. - Publication Year :
- 2007
-
Abstract
- A method to form epitaxial Ge1-xSnx quantum dots (QDs) on Si (111) substrates has been developed by codeposition of Ge and Sn on ultrathin SiO2 films with predeposited Ge nuclei. Hemispherical Ge1-xSnx QDs with an ultrahigh density (∼1012 cm-2) were epitaxially grown in the nanometer-size range. The QD size was controlled by changing the GeSn deposition amount. High-resolution transmission electron microscopy observations revealed that the main formed Ge1-xSnx QDs had less strain and no misfit dislocations. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 102
- Issue :
- 12
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 31158759
- Full Text :
- https://doi.org/10.1063/1.2822271