Hexamethyldisilazane vapor treatment of plasma damaged nanoporous methylsilsesquioxane films: Structural and electrical characteristics

MLA

Rajagopalan, T., et al. “Hexamethyldisilazane Vapor Treatment of Plasma Damaged Nanoporous Methylsilsesquioxane Films: Structural and Electrical Characteristics.” Thin Solid Films, vol. 516, no. 10, Mar. 2008, pp. 3399–404. EBSCOhost, https://doi.org/10.1016/j.tsf.2007.10.110.

APA

Rajagopalan, T., Lahlouh, B., Chari, I., Othman, M. T., Biswas, N., Toma, D., & Gangopadhyay, S. (2008). Hexamethyldisilazane vapor treatment of plasma damaged nanoporous methylsilsesquioxane films: Structural and electrical characteristics. Thin Solid Films, 516(10), 3399–3404. https://doi.org/10.1016/j.tsf.2007.10.110

Chicago

Rajagopalan, T., B. Lahlouh, I. Chari, M.T. Othman, N. Biswas, D. Toma, and S. Gangopadhyay. 2008. “Hexamethyldisilazane Vapor Treatment of Plasma Damaged Nanoporous Methylsilsesquioxane Films: Structural and Electrical Characteristics.” Thin Solid Films 516 (10): 3399–3404. doi:10.1016/j.tsf.2007.10.110.