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Structural and electrical characterization of microcrystalline silicon films prepared by a...

Authors :
Hong, J. P.
Kim, C. O.
Source :
Journal of Applied Physics. 2/15/2000, Vol. 87 Issue 4, p1676. 5p. 7 Graphs.
Publication Year :
2000

Abstract

Presents a study which investigated the structural and electrical properties of microcrystalline silicon films prepared by a layer-by-layer technique with a plasma-enhanced chemical-vapor system. Potential applications of microcrystalline; Methodology used in the study; Results and discussion.

Details

Language :
English
ISSN :
00218979
Volume :
87
Issue :
4
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
2815343
Full Text :
https://doi.org/10.1063/1.372076