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Top-gated few-electron double quantum dot in Si/SiGe

Authors :
Shaji, Nakul
Simmons, Christine B.
Klein, Levente J.
Qin, Hua
Savage, Donald E.
Lagally, M.G.
Coppersmith, Susan N.
Joynt, Robert
Friesen, Mark
Blick, Robert H.
Eriksson, Mark A.
Source :
Physica E. Jan2008, Vol. 40 Issue 3, p520-523. 4p.
Publication Year :
2008

Abstract

Abstract: A few-electron quantum dot utilizing Schottky, metal top gates in a modulation doped Si/SiGe heterostructure was realized and non-linear transport through the dot was studied. By carefully tuning the capacitively coupled gates, the single quantum dot was transformed into two tunnel-coupled quantum dots in series. The resulting double quantum dot was tuned to the few-electron regime and the charge stability diagram was studied as a function of the gate voltages. Understanding of such a double dot system is essential for the practical implementation of exchange-mediated multi-qubit systems in silicon devices. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
13869477
Volume :
40
Issue :
3
Database :
Academic Search Index
Journal :
Physica E
Publication Type :
Academic Journal
Accession number :
28117727
Full Text :
https://doi.org/10.1016/j.physe.2007.07.028