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A replication process of metallic micro-mold by using parylene embossing and electroplating

A replication process of metallic micro-mold by using parylene embossing and electroplating

Authors :
Youn, Sung-Won
Goto, Hiroshi
Takahashi, Masaharu
Oyama, Shoji
Oshinomi, Yasuhiko
Matsutani, Kinya
Maeda, Ryutaro
Source :
Microelectronic Engineering. Jan2008, Vol. 85 Issue 1, p161-167. 7p.
Publication Year :
2008

Abstract

Abstract: This study demonstrated a replication process for metallic micro-mold that combines the parylene-C (poly-chloro-p-xylylene C) hot-embossing and electroplating techniques. A nickel original master was fabricated using the deep RIE silicon etching followed by the electroplating process. Then, the patterned fields composed of arrays of 25μm-high, 10μm-wide and 1mm-long lines with 10μm spacing in nickel molds were successfully replicated on the 60μm-thick parylene-C films by the hot-emboss process. Under complete filling conditions, the deviation of the replicated micropattern was less than 2.4%. The electroplated copper successfully filled parylene-C replica master patterns with the aspect ratio of 2.5 without the void formation by both adding organic addictives and controlling the seed layer thickness. After electroplating, the copper micro-mold could be successfully separated from the parylene-C replica master. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
01679317
Volume :
85
Issue :
1
Database :
Academic Search Index
Journal :
Microelectronic Engineering
Publication Type :
Academic Journal
Accession number :
27702213
Full Text :
https://doi.org/10.1016/j.mee.2007.05.005